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Silicon Carbide Wafer
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12-inch (300 mm) SiC (Silicon Carbide)

12-inch (300 mm) SiC (Silicon Carbide)

Brand Name: ZMSH
MOQ: 1
Price: by case
Packaging Details: custom cartons
Payment Terms: T/T
Detail Information
Place of Origin:
China
Polytype:
4H
Doping Type:
N-type
Diameter:
300 ± 0.5 Mm
Thickness:
Green: 600 ± 100 µm / White-transparent: 700 ± 100 µm
Surface Orientation (Off-cut):
4° Toward \<11-20\> ± 0.5°
TTV (Total Thickness Variation):
≤ 10 µm
Supply Ability:
By case
Product Description

12-Inch Silicon Carbide (SiC) Wafer – Product Introduction

Product Overview

The 12-inch Silicon Carbide (SiC) wafer represents the next generation of wide bandgap semiconductor substrates, designed to support the large-scale production of high-performance power electronic devices. Compared with conventional 6-inch and 8-inch SiC wafers, the 12-inch format significantly increases usable chip area per wafer, improves manufacturing efficiency, and offers strong potential for long-term cost reduction.

 

Silicon carbide is a wide bandgap semiconductor material featuring high breakdown electric field strength, excellent thermal conductivity, high saturated electron drift velocity, and outstanding thermal stability. These properties make 12-inch SiC wafers an ideal platform for high-voltage, high-power, and high-temperature applications.

 

12-inch (300 mm) SiC (Silicon Carbide) 0       12-inch (300 mm) SiC (Silicon Carbide) 1


Material and Crystal Specifications

  • Material: Single-crystal Silicon Carbide (SiC)

  • Polytype: 4H-SiC (standard for power devices)

  • Conductivity Type:

    • N-type (Nitrogen doped)

    • Semi-insulating (customizable)

The growth of 12-inch SiC single crystals requires advanced control of temperature gradients, stress distribution, and impurity incorporation. Improved PVT (Physical Vapor Transport) crystal growth technology is typically employed to achieve large-diameter, low-defect SiC boules.

 

 


12-inch (300 mm) SiC (Silicon Carbide) 2

Manufacturing Process

The production of 12-inch SiC wafers involves a series of high-precision processes:

  1. Large-diameter single-crystal growth

  2. Crystal orientation and ingot slicing

  3. Precision grinding and wafer thinning

  4. Single-side or double-side polishing

  5. Advanced cleaning and comprehensive inspection

Each step is tightly controlled to ensure excellent flatness, thickness uniformity, and surface quality.

 


Key Advantages

  • Higher Device Yield per Wafer: Larger wafer size enables more chips per run

  • Improved Manufacturing Efficiency: Optimized for next-generation fabs

  • Cost Reduction Potential: Lower cost per device in high-volume production

  • Superior Thermal and Electrical Performance: Ideal for harsh operating conditions

  • Strong Process Compatibility: Suitable for mainstream SiC power device fabrication

 12-inch (300 mm) SiC (Silicon Carbide) 3


Typical Applications

  • Electric vehicles (SiC MOSFETs, SiC Schottky diodes)

  • On-board chargers (OBC) and traction inverters

  • Fast-charging infrastructure and power modules

  • Solar inverters and energy storage systems

  • Industrial motor drives and railway systems

  • High-end power electronics and defense applications

 

12-inch (300 mm) SiC (Silicon Carbide) 4

 


Typical Specifications (Customizable)

Item N-type Production Grade (P) N-type Dummy Grade (D) SI-type Production Grade (P)
Polytype 4H 4H 4H
Doping Type N-type N-type /
Diameter 300 ± 0.5 mm 300 ± 0.5 mm 300 ± 0.5 mm
Thickness Green: 600 ± 100 µm / White-transparent: 700 ± 100 µm Green: 600 ± 100 µm / White-transparent: 700 ± 100 µm Green: 600 ± 100 µm / White-transparent: 700 ± 100 µm
Surface Orientation (Off-cut) 4° toward <11-20> ± 0.5° 4° toward <11-20> ± 0.5° 4° toward <11-20> ± 0.5°
Wafer ID / Primary Flat Notch (full-round wafer) Notch (full-round wafer) Notch (full-round wafer)
Notch Depth 1.0 – 1.5 mm 1.0 – 1.5 mm 1.0 – 1.5 mm
TTV (Total Thickness Variation) ≤ 10 µm NA ≤ 10 µm
MPD (Micropipe Density) ≤ 5 ea/cm² NA ≤ 5 ea/cm²
Resistivity Measurement zone: Center 8-inch Area Measurement zone: Center 8-inch Area Measurement zone: Center 8-inch Area
Si-face Surface Treatment CMP (Polished) Grinding CMP (Polished)
Edge Processing Chamfer No Chamfer Chamfer
Edge Chips (Allowable) Chip depth < 0.5 mm Chip depth < 1.0 mm Chip depth < 0.5 mm
Laser Marking C-side marking / According to customer requirements C-side marking / According to customer requirements C-side marking / According to customer requirements
Polytype Area (Polarized Light) No polytype (edge exclusion 3 mm) Polymorphism area < 5% (edge exclusion 3 mm) No polytype (edge exclusion 3 mm)
Cracks (High-intensity Light) No cracks (edge exclusion 3 mm) No cracks (edge exclusion 3 mm) No cracks (edge exclusion 3 mm)

 


Frequently Asked Questions (FAQ)

Q1: Are 12-inch SiC wafers ready for mass production?
A: 12-inch SiC wafers are currently in the early stage of industrialization and are being actively evaluated for pilot and volume production by leading manufacturers worldwide.

 

Q2: What are the advantages of 12-inch SiC wafers compared to 8-inch wafers?
A: The 12-inch format significantly increases chip output per wafer, improves fab throughput, and offers long-term cost advantages.

 

Q3: Can wafer specifications be customized?
A: Yes, parameters such as conductivity type, thickness, polishing method, and inspection grade can be customized.