• Semi Insulating 3 Inch Silicon Carbide Wafer 4H N-Type CVD Orientation 4.0°±0.5°
  • Semi Insulating 3 Inch Silicon Carbide Wafer 4H N-Type CVD Orientation 4.0°±0.5°
  • Semi Insulating 3 Inch Silicon Carbide Wafer 4H N-Type CVD Orientation 4.0°±0.5°
  • Semi Insulating 3 Inch Silicon Carbide Wafer 4H N-Type CVD Orientation 4.0°±0.5°
  • Semi Insulating 3 Inch Silicon Carbide Wafer 4H N-Type CVD Orientation 4.0°±0.5°
Semi Insulating 3 Inch Silicon Carbide Wafer 4H N-Type CVD Orientation 4.0°±0.5°

Semi Insulating 3 Inch Silicon Carbide Wafer 4H N-Type CVD Orientation 4.0°±0.5°

Product Details:

Brand Name: ZMSH
Model Number: Silicon Carbide wafer

Payment & Shipping Terms:

Delivery Time: 2-4 weeks
Payment Terms: T/T
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Detail Information

Growth Method: CVD Structure: Hexagonal, Single Crystal
Diameter: Up To 150mm, 200mm Thickness: 350µm (n-type, 3″ SI), 500µm (SI)
Grades: Prime, Dummy,Reaserch Thermal Conductivity: 370 (W/mK) At Room Temperature
Thermal Expansion Coefficient: 4.5 (10-6K-1) Specific Heat (25⁰C): 0.71 (J G-1 K-1)
High Light:

Semi Insulating Sic Wafer

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3 Inch Silicon Carbide Wafer

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Silicon Carbide Wafer 4H N-Type

Product Description

Semi-Insulating 3-Inch Silicon Carbide wafer 4H N-Type CVD Orientation : 4.0°±0.5°

Semi-Insulating 3-Inch Silicon Carbide wafer's Abstract

The unique electronic and thermal properties of silicon carbide (SiC) make it ideally suited for advanced high-power and high-frequency semiconductor devices that operate well beyond the capabilities of either silicon or gallium arsenide devices. The key advantages of SiC-based technology include reduced switching losses, higher power density, better heat dissipation, and increased bandwidth capability. At the system level, this results in highly compact solutions with vastly improved energy efficiency at reduced cost. The rapidly growing list of current and projected commercial applications utilizing SiC technologies includes switching power supplies, inverters for solar and windmill energy generation, industrial motor drives, HEV and EV vehicles, and smart-grid power switching.

Semi Insulating 3 Inch Silicon Carbide Wafer 4H N-Type CVD Orientation 4.0°±0.5° 0

Semi-Insulating 3-Inch Silicon Carbide wafer's key feature

Semi Insulating 3 Inch Silicon Carbide Wafer 4H N-Type CVD Orientation 4.0°±0.5° 1

The Semi-Insulating 3-Inch Silicon Carbide wafer exhibits key features that make it essential in various semiconductor applications. With a diameter of three inches, these wafers provide a crucial substrate for manufacturing high-performance electronic devices. The semi-insulating property, which indicates a degree of electrical insulation, is a defining characteristic, reducing current leakage and enhancing the performance of electronic components.

 

Silicon Carbide (SiC), the primary material of construction, is a compound known for its exceptional properties. SiC offers high-temperature stability, excellent hardness, and corrosion resistance, making it ideal for demanding applications. The semi-insulating nature of these wafers is advantageous in microwave and radiofrequency devices, such as power amplifiers and RF switches, where electrical isolation is crucial for optimal performance.

 

One of the prominent applications of Semi-Insulating Silicon Carbide wafers is in power electronic devices. These wafers are utilized in the manufacturing of SiC Schottky Diodes and SiC Field-Effect Transistors (FETs), contributing to the development of high-voltage and high-temperature power electronics. The material's unique characteristics make it suitable for environments where conventional semiconductors may struggle to operate efficiently.

 

Moreover, these wafers find applications in optoelectronics, specifically in the fabrication of SiC Photodiodes. The sensitivity of Silicon Carbide to ultraviolet light makes it valuable in optical sensing applications. In extreme conditions, such as high temperatures and harsh environments, Semi-Insulating SiC wafers are employed in sensors and control systems.

 

In the field of high-temperature and extreme environment applications, Semi-Insulating Silicon Carbide wafers are favored due to their stability and resilience. They play a crucial role in sensing and control systems designed to operate in challenging conditions.

In nuclear energy applications, the radiation stability of Silicon Carbide is advantageous. Wafers made from this material are used in detectors and sensors within nuclear reactors.

 

These key features collectively position Semi-Insulating 3-Inch Silicon Carbide wafers as critical components in advanced semiconductor technologies. Their contribution to high-frequency, high-power, and high-temperature applications underscores their significance in modern electronics and technology-driven industries. The continuous advancements in SiC technology further solidify the importance of these wafers in pushing the boundaries of electronic performance and reliability.

Semi-Insulating 3-Inch Silicon Carbide wafer's application

The Semi-Insulating 3-Inch Silicon Carbide wafer plays a pivotal role in various semiconductor applications, offering unique properties that contribute to the advancement of electronic devices and systems. With a three-inch diameter, these wafers are particularly influential in manufacturing high-performance electronic components.

 

The semi-insulating characteristic of these wafers is a key feature, providing electrical insulation to minimize current leakage. This property is crucial for applications where maintaining high electrical resistance is essential, such as in certain types of electronic devices and integrated circuits.

 

One prominent application of Semi-Insulating 3-Inch Silicon Carbide wafers is in the production of high-frequency and high-power electronic devices. The excellent thermal conductivity and wide bandgap of Silicon Carbide make it suitable for manufacturing devices like Schottky diodes, metal-oxide-semiconductor field-effect transistors (MOSFETs), and other power electronics components. These devices find applications in power converters, amplifiers, and radiofrequency systems.

 

The semiconductor industry also leverages these wafers in the development of sensors and detectors for extreme conditions. Silicon Carbide's robustness in high-temperature and harsh environments makes it well-suited for creating sensors that can withstand challenging conditions. These sensors are employed in various industries, including aerospace, automotive, and energy.

 

In optoelectronics, Semi-Insulating Silicon Carbide wafers are utilized for the fabrication of photodiodes and light-emitting diodes (LEDs). Silicon Carbide's unique optical properties make it suitable for applications requiring sensitivity to ultraviolet light. This is particularly advantageous in optical sensing and communication systems.

 

The nuclear industry benefits from the radiation resistance of Silicon Carbide, and these wafers find applications in radiation detectors and sensors used in nuclear reactors. The ability to withstand the harsh radiation environment makes Silicon Carbide an essential material for such critical applications.

 

Researchers and scientists continue to explore novel applications for Semi-Insulating 3-Inch Silicon Carbide wafers, driven by the material's exceptional properties. As technology advances, these wafers are expected to play a vital role in emerging fields such as quantum computing, where robust and high-performance materials are essential.

 

In summary, the Semi-Insulating 3-Inch Silicon Carbide wafer's applications span a wide range of industries, from power electronics and optoelectronics to sensing and nuclear technologies. Its versatility and unique properties position it as a key enabler for the development of advanced electronic systems that operate efficiently in demanding environments.

 

Semi-Insulating 3-Inch Silicon Carbide wafer's data chart 

Growth Method Physical Vapor Transport
Physical Properties
Structure Hexagonal, Single Crystal
Diameter Up to 150mm, 200mm
Thickness 350µm (n-type, 3″ SI), 500µm (SI)
Grades Prime, Development, Mechanical
Thermal Properties
Thermal Conductivity 370 (W/mK) at Room Temperature
Thermal Expansion Coefficient 4.5 (10-6K-1)
Specific Heat (25⁰C) 0.71 (J g-1 K-1)
Additional Key Properties of Coherent SiC Substrates (typical values*)
Parameter N-type Semi-insulating
Polytype 4H 4H, 6H
Dopant Nitrogen Vanadium
Resistivity ~0.02 Ohm-cm > 1∙1011 Ohm-cm
Orientation 4° off-axis On-axis
FWHM < 20 arc-sec < 25 arc-sec
Roughness, Ra** < 5 Å < 5 Å
Dislocation density ~5∙103 cm-2 < 1∙104 cm-2
Micropipe density < 0.1 cm-2 < 0.1 cm-2

* Typical Production Values – Contact Us for Standard Specifications or Custom Requests
** Measured by White Light Interferometry (250µm x 350µm)Material Properties

Semi Insulating 3 Inch Silicon Carbide Wafer 4H N-Type CVD Orientation 4.0°±0.5° 2

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