| Brand Name: | ZMSH |
| Model Number: | sapphire wafer |
| MOQ: | 10 PCS |
| Price: | 55usd |
| Packaging Details: | Vacuum Package |
| Payment Terms: | T/T |
3-inch Single Crystal Sapphire Wafer, C-Plane (0001), SSP/DSP , Al₂O₃ Epitaxial-Grade Substrate
This is a 3-inch (Φ76.2 mm) high-purity single-crystal α-Al₂O₃ sapphire wafer with a standard C-plane (0001) crystal orientation. It is available in two finishes — SSP and DSP — and supports fully customizable parameters including off-axis angle, thickness and primary flat.A sapphire substrate is a thin slice fabricated from single-crystal sapphire material. Owing to its exceptional physical and chemical properties, it is widely applied in optoelectronics, microelectronics and other high-tech fields.
| Parameter | Specification |
| Diameter | 76.2 ± 0.3mm |
| Type | 4H-N/HPSI/4H-SEMI |
| Thickness | 350 ± 25 μm |
| 500 ± 25 μm or customized | |
| Roughness | Ra ≤ 0.2 μm |
| Warp | ≤ 30μm |
| TTV | ≤ 10 μm |
| Scratch/Digi | CMP/MP |
| MPD | <1 ea/cm² |
| Bevel | 45°, SEMI Spec; C Shape |
| Grade | Propulsion grade for MOS&SBD; Research grade; Dummy grade, Seed wafer Grade |
| Remarks | Diameter, Thickness, Orientation, specifications above can be customized upon your request |
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Single-crystal α-Al₂O₃ sapphire is a core substrate material for third-generation semiconductors and high-end optics, with outstanding comprehensive performance:
High thermal stability With a melting point of approximately 2050℃, it withstands high-temperature manufacturing processes.
Its low thermal expansion coefficient minimizes deformation at elevated temperatures, making it compatible with high-temperature epitaxial processes such as MOCVD and HVPE.
High hardness and wear resistance Rated 9 on the Mohs scale (second only to diamond), it boasts high mechanical strength, scratch resistance and low chipping risk, ensuring high process yield.
Chemical stability Resistant to acid/alkali corrosion and plasma etching, it adapts to various semiconductor processes including cleaning and etching, with low risk of impurity contamination.
Broad-spectrum transmittance It delivers high transmittance across the UV, visible and near-infrared bands, with no photoluminescence interference and high light extraction efficiency.
Mature lattice matching The C-plane orientation is highly matched with GaN epitaxial processes. The grain-boundary-free single-crystal structure enables the growth of high-quality gallium nitride thin films.
Excellent insulation performance Intrinsically highly insulating with low dielectric loss at high frequencies, it is an ideal insulating substrate for RF and microwave devices.
Optoelectronic devices: Epitaxial substrates for blue/green LEDs, UV LEDs and Mini/Micro LEDs; bases for patterned sapphire substrates (PSS); substrates for laser diodes
Semiconductors & RF: GaN power device epitaxy, silicon-on-sapphire (SOS) integrated circuits, microwave RF chips, substrates for 5G communication power amplifiers
Optics & sensing: UV/IR optical windows, laser resonator lenses, sensor substrates, precision optical carriers, coating substrates
Scientific research & education: University laboratory material research, thin film deposition experiments, MOCVD process verification, crystal property test specimens
4inch Sapphire Wafer 200um Thickness C Axis Highly Applied for Semiconductor
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Premium 12inch Sapphire Wafer for High Quality Lighting and Consumer Electronics Industries
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Q: Why choose sapphire as a substrate material?
A: Single-crystal sapphire (Al₂O₃) features exceptional hardness, chemical resistance, optical transparency and high-temperature stability. These properties make 3-inch sapphire wafers highly suitable for LEDs, RF devices, microwave applications, micro-electro-mechanical systems (MEMS), photonics and semiconductor research.
Q: What sapphire substrate diameters are available?
A: We offer both standard and custom sapphire wafer diameters for research, optics, MEMS, LED, GaN, RF and high-temperature applications. You may select from the sapphire substrate sizes listed below, or send us your required specifications for a custom quote.
Q: What handling precautions are recommended during wafer cleaning?
A: It is advised to use non-abrasive cleaning techniques in a cleanroom environment. Avoid mechanical stress and contamination by using ultra-pure solvents and lint-free materials to maintain the substrate's surface integrity and prevent defect introduction.
ZMSH specializes in high-tech development, production, and sales of special optical glass and new crystal materials. Our products serve optical electronics, consumer electronics, and the. We offer Sapphire optical components, mobile phone lens covers, Ceramics, LT, Silicon Carbide SIC, Quartz, and semiconductor crystal wafers. With skilled expertise and cutting-edge equipment, we excel in non-standard product processing, aiming to be a leading optoelectronic materials high-tech enterprise.
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