SrLaAlO₄ / LaSrAlO₄ LSAO 10x10x0.5mmt5x5x1mmt Substrate For Epitaxy Customized
Product Details:
Place of Origin: | China |
Brand Name: | ZMSH |
Payment & Shipping Terms:
Minimum Order Quantity: | 10 |
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Detail Information |
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Melting Point: | ~1650–1700 °C | Color: | Transparent To Pale Yellow |
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Mohs Hardness: | 6–6.5 | Typical Crystal Orientation: | (001), (100), (110) |
Highlight: | Customized LSAO Substrate,Epitaxy LSAO Substrate,SrLaAlO₄ LSAO Substrate |
Product Description
SrLaAlO₄ /LaSrAlO₄ LSAO10x10x0.5mmt5x5x1mmt Substrate for Epitaxy customized
Abstract of SrLaAlO₄ / LaSrAlO₄/LASO
SrLaAlO₄ , also written as LaSrAlO₄ depending on the elemental order, is a complex oxide crystal composed of strontium (Sr), lanthanum (La), aluminum (Al), and oxygen (O). It is a member of the perovskite-related family of oxides, widely studied and used in materials science due to its favorable structural, thermal, and lattice-matching properties. The material is most well-known for its use as a substrate for the epitaxial growth of high-temperature superconducting (HTS) films.
Attribute Table of SrLaAlO₄ /LaSrAlO₄/LASO
Property | Value / Description |
Chemical Formula | SrLaAlO₄ or LaSrAlO₄ |
Crystal Structure | Tetragonal |
Space Group | I4/mmm |
Lattice Constants | a = 3.754 Å, c = 12.63 Å (typical) |
Density | ~6.56 g/cm³ |
Melting Point | ~1650–1700 °C |
Thermal Expansion Coefficient | ~7.4 × 10⁻⁶ /K |
Refractive Index | ~1.84 (at 633 nm wavelength) |
Color | Transparent to pale yellow |
Mohs Hardness | 6–6.5 |
Typical Crystal Orientation | (001), (100), (110) |
Main Applications | Substrate for epitaxial growth of high-Tc superconductors like YBCO |
Lattice Matching | Good match with YBa₂Cu₃O₇ (YBCO), La₂CuO₄, and similar oxides |
Growth Method | Czochralski (CZ) method |
Crystal Form | Single crystal |
Surface Finish | SSP (Single-Side Polished), DSP (Double-Side Polished) |
Physical image of the SrLaAlO₄ /LaSrAlO₄/ LASO display
Benefits of the SrLaAlO₄ /LaSrAlO₄/ LASO as a substrate
Lattice Matching: The lattice constants of SrLaAlO₄ closely match those of YBCO and La₂CuO₄, resulting in low strain and high-quality epitaxial interfaces.
Thermal Stability: It withstands high-temperature deposition processes (up to ~1000 °C) without significant degradation.
Chemical Stability: Inert against most deposition atmospheres, including oxygen-rich environments used in oxide MBE and PLD.
Surface Quality: High-quality polishing yields flat, defect-free surfaces with roughness <1 nm RMS, essential for thin-film uniformity.
Common Applications of the SrLaAlO₄ /LaSrAlO₄/LASO
Epitaxial Substrate for High-Tc Superconductors
The most widespread use of LaSrAlO₄ is as a substrate for YBCO (YBa₂Cu₃O₇₋ₓ) and similar HTS films. It enables the growth of highly oriented, epitaxial, defect-free films, essential for maximizing the critical current density (Jc) and transition temperature (Tc).
Oxide Electronics
LaSrAlO₄ is suitable for the growth of other perovskite-type oxide films used in ferroelectrics, dielectrics, and spintronics. Films like LaAlO₃, SrTiO₃, or LaMnO₃ can be grown on LaSrAlO₄ substrates.
Photonic and Electro-Optic Devices
Due to its optical transparency and flat, stable surface, it can also serve as a host or base for optical coatings, waveguides, and nonlinear optical devices in the visible and near-infrared range.
Multiferroic Heterostructures
SrLaAlO₄ is also used in research involving multiferroic and magnetoelectric devices, where high-quality interfaces between layers are essential.
Q&A
Q:Why SrLaAlO₄ is Important?
A:The importance of SrLaAlO₄ arises primarily from its crystallographic compatibility with high-Tc superconducting films. One of the major challenges in growing high-quality superconducting thin films is lattice mismatch between the film and the substrate. Even a small mismatch can cause misfit dislocations, which degrade the superconducting properties. SrLaAlO₄ offers a nearly perfect lattice match to many oxide superconductors and related materials.
In addition, the thermal expansion coefficient of SrLaAlO₄ is also close to that of these films, minimizing thermal stress during temperature cycling (e.g., from deposition at high temperature to cooling for cryogenic measurements or applications).
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