Brand Name: | ZMSH |
MOQ: | 1 |
Price: | by case |
Packaging Details: | custom cartons |
Payment Terms: | T/T |
Ion Beam Polishing Machine
Atomic-Level Precision · Non-Contact Processing · Ultra-Smooth Surfaces
Product Overview of Ion Beam Polishing Machine
The CNC Ion Beam Figuring/Polishing Machine operates on the principle of ion sputtering. Under vacuum conditions, the ion source generates a plasma beam, which is accelerated into an ion beam that bombards the workpiece surface for atomic-level material removal, enabling ultra-precise fabrication of optical components.
This technology offers non-contact processing, free from mechanical stress or subsurface damage, and is ideal for high-precision optics in astronomy, aerospace, semiconductors, and scientific research.
Non-contact processing – Capable of handling all surface shapes
Stable removal rate – Sub-nanometer figure correction accuracy
No subsurface damage – Preserves optical integrity
High consistency – Minimal fluctuation across materials of varying hardness
Low/Medium frequency correction – No mid-high frequency error generation
Low maintenance cost – Long-term continuous operation with minimal downtime
Available Surfaces:
Simple Optical Components: Plane, sphere, prism
Complex Optical Components: Symmetric/asymmetric asphere, off-axis asphere, cylindrical surface
Special Optical Components: Ultra-thin optics, slat optics, hemispherical optics, conformal optics, phase plates, freeform surfaces, other custom shapes
Available Materials:
Common optical glass: Quartz, Microcrystalline, K9, etc.
Infrared optics: Silicon, Germanium, etc.
Metals: Aluminum, Stainless Steel, Titanium Alloy, etc.
Crystal materials: YAG, Single-crystal Silicon Carbide, etc.
Other hard/brittle materials: Silicon Carbide, etc.
Surface Quality / Accuracy:
PV < 10 nm
RMS ≤ 0.5 nm
Atomic-level removal precision – Enables ultra-smooth surfaces for demanding optical systems
Versatile shape compatibility – From flat optics to complex freeforms
Broad material adaptability – From precision crystals to hard ceramics and metals
Large aperture capability – Processes optics up to Φ4000 mm
Extended stable operation – Runs 3–5 weeks without vacuum chamber maintenance
IBF350 / IBF750 / IBF1000 / IBF1600 / IBF2000 / IBF4000
Motion Axes: 3-axis / 5-axis
Max Workpiece Size: up to Φ4000 mm
Item | Specification |
---|---|
Processing Method | Ion sputtering material removal under vacuum |
Processing Type | Non-contact surface figuring & polishing |
Available Surfaces | Plane, sphere, prism, asphere, off-axis asphere, cylindrical surface, freeform surface |
Available Materials | Quartz, microcrystalline glass, K9, sapphire, YAG, silicon carbide, single-crystal silicon carbide, silicon, germanium, aluminum, stainless steel, titanium alloy, etc. |
Max Workpiece Size | Φ4000 mm |
Motion Axes | 3-axis / 5-axis |
Removal Stability | ≥95% |
Surface Accuracy | PV < 10 nm; RMS ≤ 0.5 nm (typical RMS < 1 nm; PV < 15 nm) |
Processing Capability | Corrects low–medium frequency errors without introducing mid-high frequency errors |
Continuous Operation | 3–5 weeks without vacuum chamber maintenance |
Maintenance Cost | Low |
Typical Models | IBF350 / IBF750 / IBF1000 / IBF1600 / IBF2000 / IBF4000 |
Case 1 – Standard Flat Mirror
Workpiece: D630 mm Quartz flat
Case 2 – X-ray Reflective Mirror
Workpiece: 150 × 30 mm Silicon flat
Result: PV 8.3 nm; RMS 0.379 nm; Slope 0.13 µrad
Case 3 – Off-Axis Mirror
Workpiece: D326 mm Off-axis ground mirror
Result: PV 35.9 nm; RMS 3.9 nm
Astronomical optics – Large telescope primary/secondary mirrors
Space optics – Satellite remote sensing, deep-space imaging
High-power laser systems – ICF optics, beam shaping
Semiconductor optics – Lithography lenses & mirrors
Scientific instrumentation – X-ray/neutron mirrors, metrology standard components