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Custom Ceramic End Effector Alumina Ceramic Handling Arm for Semiconductor Wafer Handling

Custom Ceramic End Effector Alumina Ceramic Handling Arm for Semiconductor Wafer Handling

Brand Name: ZMSH
Model Number: Ceramic End Effector
MOQ: 1 PCS
Price: 10usd
Packaging Details: Customizable
Payment Terms: T/T
Detail Information
Place of Origin:
China
Certification:
Rohs
Material:
SiC And Al2O3 Ceramic
Hardness:
2500 Vickers Hardness
Sublimation Temperature:
2700℃
Heat Capacity:
640J·kg-1 ·K-1
Supply Ability:
by case
Product Description

Custom Ceramic End Effector Alumina Ceramic Handling Arm for Semiconductor Wafer Handling

 

Product Description:

 

Ceramic End Effector is the robot's hand which move semiconductor wafers between positions in wafer processing equipment and carriers. End effector must be dimensionally precise and thermally stable, while having a smooth, abrasion-resistant surface to safely handle wafers without damaging devices or producing particulate contamination. Our high-purity silicon carbide Ceramic End Effector provide superior heat resistance, even thermal uniformity for consistent epi layer thickness and resistance, and durable chemical resistance.

 

Parameters of Ceramic End Effector:

 

Main Specifications of CVD-SIC Coating
SiC-CVD Properties
Crystal Structure FCC β phase
Density g/cm ³ 3.21
Hardness Vickers hardness 2500
Grain Size μm 2~10
Chemical Purity % 99.99995
Heat Capacity J·kg-1 ·K-1 640
Sublimation Temperature ℃ 2700
Felexural Strength MPa (RT 4-point) 415
Young’ s Modulus Gpa (4pt bend, 1300℃) 430
Thermal Expansion (C.T.E) 10-6K-1 4.5
Thermal conductivity (W/mK) 300

 

Custom Ceramic End Effector Alumina Ceramic Handling Arm for Semiconductor Wafer HandlingCustom Ceramic End Effector Alumina Ceramic Handling Arm for Semiconductor Wafer Handling

 

Advantages:

 

1.Ultra-High Cleanliness, Low Particle Emission

High-purity dense ceramic substrate with ultra-precision polishing (Ra ≤ 0.2μm) produces minimal debris and no organic outgassing, preventing micro-particle contamination. Suitable for Class 100+ cleanrooms and vacuum chambers.

 

2.Excellent Insulation & ESD Protection

Superior electrical insulation blocks electrostatic conduction, avoids ESD damage to wafer circuits, reduces electrostatic adsorption and particle adhesion, and protects process yield.

 

3.High Specific Stiffness, Minimal Deformation

Ceramic has far higher specific stiffness than metals. Long-arm deflection is negligible with micron-level flatness and parallelism; no chatter at high speed, with ±0.1mm repeat positioning accuracy.

 

4.High Temperature & Corrosion Resistance

Alumina withstands up to 1650℃; SiC offers better thermal stability. Chemically inert to acids, alkalis and solvents, it outlasts metal/plastic parts in wet cleaning, etching and diffusion processes.

 

5.Low Thermal Expansion, Dimensional Stability

Far lower thermal expansion coefficient than metals ensures minimal dimensional shift under temperature fluctuations, preserving positioning accuracy in vacuum chambers and high-temperature processes.

 

6.Lightweight Design, Reduced Arm Load

Lighter than stainless steel at equal strength, it reduces end-of-arm load, improves motion response, and lowers energy consumption and mechanical wear.

 

7.Non-Magnetic, Zero Interference

Non-magnetic ceramic causes no magnetic interference to sensitive components and inspection equipment, ideal for magnetron sputtering and precision testing processes.

 

Custom Ceramic End Effector Alumina Ceramic Handling Arm for Semiconductor Wafer Handling

 

Application:

  • Semiconductor wafer fabrication: wafer transfer in all process sections including photolithography, etching, deposition, ion implantation and cleaning
  • Packaging and testing links: inter-process workpiece handling for thinning, dicing, bonding, sorting, inspection and other procedures
  • Third-generation semiconductors: process transfer of SiC, GaN and sapphire wafers
  • MEMS, optoelectronics and power device manufacturing
  • Precision handling of photovoltaic silicon wafers and display panel glass substrates
  • Precision process equipment in research institutes and university laboratories

Custom Ceramic End Effector Alumina Ceramic Handling Arm for Semiconductor Wafer Handling

 

Related Products:

 

SiC Ceramic Tray Plate Wafer Holder For ICP Etching Process In Epitaxial Growth Processing

SiC Ceramic Tray Plate Wafer Holder For ICP Etching Process In Epitaxial Growth Processing

 

Alumina Ceramic / Mechanical Arm / Suction Cup / Ceramic Structural Parts Al2O3

Name

 

Q&A:

 

Q1: What is an end effector?

A: An end effector is an end-of-arm tool mounted on robotic arms. It grips, transfers and positions workpieces like wafers and glass substrates, acting as a core component for automated material handling in precision manufacturing.

 

Q2: What types of ceramic end effectors are available?

A: Main types include fork-type for standard wafer transfer, vacuum suction type for stable holding, Bernoulli non-contact type for ultra-thin wafers, and gripper type for special substrates. Custom structures are supported on request.

 

Q3: What are the advantages of ceramic end effectors?

A: Ceramic end effectors generate minimal particles, provide reliable ESD protection, and feature high rigidity, excellent temperature and corrosion resistance. Lightweight and non-magnetic, they outlast metal and plastic alternatives in clean semiconductor processes.

 

About Us

 

ZMSH specializes in high-tech development, production, and sales of special optical glass and new crystal materials. Our products serve optical electronics, consumer electronics, and the. We offer Sapphire optical components, mobile phone lens covers, Ceramics, LT, Silicon Carbide SIC, Quartz, and semiconductor crystal wafers. With skilled expertise and cutting-edge equipment, we excel in non-standard product processing, aiming to be a leading optoelectronic materials high-tech enterprise.

Sapphire Wafer Blank High Purity Raw Sapphire Substrate For Processing 5