| Brand Name: | ZMSH |
| MOQ: | 2 |
| Price: | by case |
| Packaging Details: | custom cartons |
| Payment Terms: | T/T |
The probe station chuck is a key component of a probe station, designed to support, hold, and position wafers or samples during electrical testing and device characterization. It provides a stable testing platform for wafers, chips, substrates, and semiconductor devices, ensuring reliable contact between the probe needles and the device under test.
The chuck is commonly used in wafer probing, semiconductor parameter testing, failure analysis, R&D verification, and production inspection. According to different testing requirements, the chuck can be designed as a standard chuck, vacuum chuck, hot chuck, or customized chuck with special surface treatment and mounting structure.
![]()
The main function of the probe station chuck is to keep the wafer or sample flat, stable, and accurately positioned during the probing process. Through vacuum adsorption or mechanical holding, the chuck prevents sample movement and improves the repeatability and accuracy of electrical measurements.
For temperature-related testing, the chuck can also be integrated with heating modules, temperature sensors, or cooling structures to support stable thermal control during measurement.
The chuck surface is designed to firmly support the wafer or sample during probing. Vacuum holes or vacuum grooves can be customized to achieve reliable adsorption for different wafer sizes.
Precision machining and polishing help ensure good surface flatness, which is important for stable wafer contact and accurate probe testing.
The chuck can be designed with vacuum holes, ring-shaped vacuum grooves, or multi-zone vacuum adsorption structures to match different sample sizes and test requirements.
For hot chuck applications, materials with good thermal conductivity can be selected to improve heating efficiency and temperature uniformity.
Surface treatments such as gold plating, nickel plating, anodizing, ceramic coating, or other protective coatings are available to improve wear resistance, oxidation resistance, conductivity, or insulation performance.
The bottom structure, mounting holes, vacuum ports, and connection interface can be customized according to the customer’s probe station design.
| Type | Description |
|---|---|
| Standard Chuck | Used for general wafer or sample holding during room-temperature probing |
| Vacuum Chuck | Uses vacuum adsorption to hold wafers or samples firmly in place |
| Hot Chuck | Integrated with heating function for high-temperature probing and thermal testing |
| High / Low Temperature Chuck | Designed for temperature-variable electrical testing |
| Customized Chuck | Designed according to special wafer size, material, coating, or equipment interface |
| Item | Options |
|---|---|
| Wafer Size | 2", 3", 4", 6", 8" or customized |
| Material | Aluminum alloy, copper alloy, stainless steel, ceramic, etc. |
| Surface Finish | Polished, plated, coated, anodized, or customized |
| Vacuum Structure | Vacuum holes, vacuum grooves, multi-zone vacuum design |
| Temperature Function | Room temperature, heating, cooling, or high/low temperature control |
| Surface Flatness | Customized according to testing accuracy requirements |
| Mounting Structure | Designed according to probe station installation interface |
| Application | Wafer testing, chip testing, semiconductor device probing, R&D testing |
![]()
A probe station chuck is a precision holding platform used in a probe station to support and fix wafers, chips, or substrates during electrical testing. It helps keep the sample stable and accurately positioned while probe needles contact the device.
The main function is to hold the wafer or sample firmly during probing. It provides stable support, reliable vacuum adsorption, accurate positioning, and optional temperature control for semiconductor testing.
The chuck can be customized for different wafer sizes, such as 2 inch, 3 inch, 4 inch, 6 inch, 8 inch, or other special sizes according to customer requirements.